Work

Thickness dependent microstructural and electrical properties of TiN thin films prepared by DC reactive magnetron sputtering

Year: 2015

Type: article

Source: Ceramics International

DOI: 10.1016/j.ceramint.2015.10.070

Authors: Hailong Liang, Jin Xu, Dayu Zhou, Xu Sun, Shichao Chu, Yizhen Bai

Institutions: Dalian University of Technology, Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian Neusoft University of Information

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Award: HfO2基新型铁电薄膜的自发极化机制和失效行为研究

OpenAlex ID: W2191151966

FWCI: 5.304

Cites: 31

Cited by: 114

Related to: 10