A Path Toward Non-Destructive 3D Metrology for Through-Silicon Vias
Year: 2011
Type: conference-paper
Source: IMAPSource Proceedings
Institution: University at Albany, State University of New York
Language: English
Topic: 3D IC and TSV technologies
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2252859027
