Work

All Co 2 -processed 157-nm fluoropolymer-containing photoresist systems

Year: 2001

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.436835

Authors: Christopher L. McAdams, Devin Flowers, Erik N. Hoggan, Ruben G. Carbonell, Joseph M. DeSimone

Institutions: University of North Carolina at Chapel Hill, North Carolina State University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDGs: Responsible consumption and production, Climate action

Open Access status: closed

Funder: National Science Foundation

OpenAlex ID: W2286398575

FWCI: 2.787

Cites:

Cited by: 6

Related to: 10