Work

High-aspect-ratio sub-micron trench etching on SOI using wet metal-assisted chemical etching (MaCE) process

Year: 2016

Type: conference-paper

Source: IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

DOI: 10.1109/memsys.2016.7421657

Authors: Benoit Hamelin, Liyi Li, Anosh Daruwalla, Ching-Ping Wong, Farrokh Ayazi

Institution: Georgia Institute of Technology

Language: English

Topic: Advanced MEMS and NEMS Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2288831037

FWCI: 2.345

Cites: 12

Cited by: 7

Related to: 10