Work

Source mask optimization study based on latest Nikon immersion scanner

Year: 2016

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2223576

Authors: Jun Zhu, Fang Wei, Lijun Chen, Chenming Zhang, Wei Zhang, Hisashi Nishinaga, Omar El-Sewefy, Gen-Sheng Gao, Neal Lafferty, Jason Meiring, Recoo Zhang, Cynthia Zhu

Institutions: Fudan University, Shanghai Huali Microelectronics (China), Nikon (Japan), Mentor Graphics (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2303930978

FWCI:

Cites: 5

Cited by: 1

Related to: 10