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450mm etch process development and process chamber evaluation using 193i DSA guided pattern

Year: 2016

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2218537

Authors: Wenli Collison, Yii-Cheng Lin, Shannon Dunn, Hiroaki Takikawa, James Paris, Lucy Chen, Troy Detrick, Jun Belen, George Stojakovic, Michael Goss, Norman Fish, Minjoon Park, Chih-Ming Sun, Mark Kelling, Pinyen Lin

Institutions: SUNY Polytechnic Institute, Taiwan Semiconductor Manufacturing Company (China), Taiwan Semiconductor Manufacturing Company (Taiwan), Hitachi High-Tech (Japan), Hitachi (Japan), Applied Materials (United States), Lam Research (United States), Intel (United States), Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2311324851

FWCI: 0.938

Cites:

Cited by: 2

Related to: 10