Work

In Situ Observation of Water Behavior at the Surface and Buried Interface of a Low-K Dielectric Film

Year: 2014

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/am504833v

Authors: Xiaoxian Zhang, John N. Myers, Jeffery D. Bielefeld, Qinghuang Lin, Zhan Chen

Institutions: University of Michigan, Intel (United States), IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Semiconductor Research Corporation

Award: G1086239709

OpenAlex ID: W2321066526

FWCI: 1.352

Cites: 48

Cited by: 26

Related to: 10