Work

MBE growth using by EIES rate monitor.

Year: 1987

Type: article

Source: Shinku

DOI: 10.3131/jvsj.30.339

Authors: Junro SAKAI, Kimiaki HIRAMA, Shun-ichi MURAKAMI, Bunzou KIYONAGA, Masahiko KOBAYASHI, Tetsuo ISHIDA

Institution: Anelva Corporation (Japan)

Language: English

Topic: Advanced Materials and Semiconductor Technologies

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W2323444883

FWCI:

Cites: 1

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Related to: 10