Work

Direct Chemical Vapor Deposition Growth of WS2 Atomic Layers on Hexagonal Boron Nitride

Year: 2014

Type: article

Source: ACS Nano

DOI: 10.1021/nn503093k

Authors: Mitsuhiro Okada, Takumi Sawazaki, Kenji Watanabe, Takashi Taniguch, Hiroki Hibino, Hisanori Shinohara, Ryo Kitaura

Institutions: Nagoya University, National Institute for Materials Science, NTT (Japan), NTT Basic Research Laboratories

Language: English

Topic: 2D Materials and Applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Education, Culture, Sports, Science and Technology, Nagoya University, Japan Society for the Promotion of Science

Awards: G1649117475, G1680500184, G7648599709, G8160924747, G8161796756, Study of substrates for h-BN single crystal growth by chemical vapor deposition method

OpenAlex ID: W2323627322

FWCI: 11.63

Cites: 29

Cited by: 309

Related to: 10