Work

Reduced Contact Resistance in Inkjet Printed High-Performance Amorphous Indium Gallium Zinc Oxide Transistors

Year: 2012

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/am201776p

Authors: Jonathan W. Hennek, Yu Xia, Ken Everaerts, Mark C. Hersam, Antonio Facchetti, Tobin J. Marks

Institution: Northwestern University

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

Funder: Office of Naval Research

OpenAlex ID: W2324649247

FWCI: 5.93

Cites: 62

Cited by: 72

Related to: 10