Year: 2016
Type: article
Abstract: A reversibly switchable electromagnetic oxide device is demonstrated by using a thin-film transistor structure with a newly developed leakage-free electrolyte as a gate insulator. The electrical and magnetic behavior of the device can be switched from antiferromagnetic insulation to ferromagnetic metal electrically under DC voltage of ±3 V at room temperature. The result provides a novel design concept for practical memory devices.
Source: Advanced Electronic Materials
Authors: Takayoshi Katase, Yuki Suzuki, Hiromichi Ohta
Institution: Hokkaido University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W2324847810
