Work

Effects of Initial Substrate Surface on Microstructure of Si3N4 Deposited by LPCVD

Year: 1992

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-280-665

Author: Woo Y. Lee

Institutions: United Technologies Research Center, United Technologies (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2329258893

FWCI:

Cites: 3

Cited by:

Related to: 10