Work

The chemistry of thin film deposits formed from hexamethyldisiloxane and hexamethyldisilazane plasmas

Year: 1996

Type: conference-paper

DOI: 10.1142/9789814503914_0031

Authors: S. M. Bushnell-Watson, M. R. Alexander, A. P. Ameen, W. M. Rainforth, R. D. Short, F. R. Jones, W. Michaeli, M. Stollenwerk, G. Mathar, J. Zabold

Institutions: University of Sheffield, RWTH Aachen University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Engineering and Physical Sciences Research Council

OpenAlex ID: W2329292677

FWCI:

Cites:

Cited by:

Related to: 10