Development of Fabricating Method of Nanoscale Pit with High Aspect Ratio Using Carbon Nanotube Probe
Year: 2004
Type: article
Abstract: Fabrication of a high aspect ratio nanoelectromechanical systems (NEMs) and nanodevices is an indispensable challenge as microelectromechanical systems shrink towards the nanoscale. Here, we focus our attention on a fabrication technique that makes use of the scanning tunneling microscope. Additionally, we tried to establish a fabricating method for a nanoscale pit with a high aspect ratio by using carbon nanotube (CNT) as the probe. The nanostructures produced were Au thin films on mica substrates that were prepared by magnetron sputtering. The results of our experiment show that a threshold value exists for the fabrication of the pits between 1V and 2V. The depth and diameter of the pit increased with the increase in the bias voltage and tunnel current, respectively. Consequently, a bias voltage of 3V and tunnel current of 4nA were found to be the optimum conditions for a high aspect ratio nanoscale pit fabrication up to 4.5. In changing the fabricating time, depth of the pit increased with the increase in fabricating time, with a little change in the diameter of the pit. This demonstrates that CNT probes can be useful for fabricating structures without changing the diameter of nanoscale CNT probe.
DOI: 10.2493/jspe.70.867
Authors: Norikazu ARIMA, Tomohiko SUGIYAMA, Yohei FUJIMOTO, Shigeo KOTAKE, Akihito MATSUMURO
Institutions: Nagoya University, Mie University
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: diamond
OpenAlex ID: W2332435732