Work

Chemical and Structural Investigation of High-Resolution Patterning with HafSOx

Year: 2014

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/am405463u

Authors: Richard P. Oleksak, Rose E. Ruther, Feixiang Luo, Kurtis C. Fairley, Shawn R. Decker, William F. Stickle, Darren W. Johnson, Eric L. Garfunkel, Gregory S. Herman, Douglas A. Keszler

Institutions: Oregon State University, Rutgers, The State University of New Jersey, University of Oregon, Hewlett-Packard (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Research Corporation for Science Advancement, Division of Chemistry

OpenAlex ID: W2332769143

FWCI: 7.971

Cites: 22

Cited by: 88

Related to: 10