Work

Nonbulk Complex Structures in Thin Films of Symmetric Block Copolymers on Chemically Nanopatterned Surfaces

Year: 2012

Type: article

Source: Macromolecules

DOI: 10.1021/ma202777s

Authors: Guoliang Liu, François Detcheverry, Abelardo Ramírez-Hernández, Hiroshi Yoshida, Yasuhiko Tada, Juan J. de Pablo, Paul F. Nealey

Institutions: University of Wisconsin–Madison, Lyon 1 Université, Centre National de la Recherche Scientifique, Université de Lyon, Hitachi (Japan)

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2335493183

FWCI: 3.824

Cites: 59

Cited by: 40

Related to: 10