Realizing Efficient Volume Depletion in SOI Junctionless FETs
Year: 2016
Type: article
Abstract: In this paper, we provide a simple and effective solution to realize efficient volume depletion and therefore, significantly reduce the OFF-state leakage current of a junctionless FET (JLFET) by replacing the SiO2by HfO2in the buried oxide (BOX). Using calibrated 2-D simulations, we show that the JLFET with a high-k BOX (HB JLFET) exhibits a considerably high ION/IOFFratio of ~106even for a channel length of 20 nm. Further, we demonstrate that the use of a high-k BOX leads to a reduction in both gate capacitance Cgand gate-to-drain feedback (Miller) capacitance Cgd.
Authors: Shubham Sahay, Mamidala Jagadesh Kumar
Institution: Indian Institute of Technology Delhi
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $1,350
OpenAlex ID: W2338928288
