Work

Substrate dependentd characteristics of hydrogenated amorphous silicon films prepared by glow discharge method.

Year: 1989

Type: article

Source: IEEJ Transactions on Fundamentals and Materials

DOI: 10.1541/ieejfms1972.109.327

Authors: Mitsuya Motohashi, Kazuaki Homma, Toyoji Fukami

Institution: Tokyo Denki University

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W2340420068

FWCI:

Cites: 8

Cited by:

Related to: 10