Work

Self-Assembled Nanoparticle Arrays on Chemical Nanopatterns Prepared Using Block Copolymer Lithography

Year: 2015

Type: article

Source: ACS Macro Letters

DOI: 10.1021/acsmacrolett.5b00644

Authors: M. Serdar Onses, Lei Wan, Xiaoying Liu, N. Burak Kiremitler, Hatice Yılmaz, Paul F. Nealey

Institutions: Erciyes University, Western Digital (United States), Hitachi Global Storage Technologies (United States), University of Chicago, Argonne National Laboratory

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2344180423

FWCI: 2.029

Cites: 40

Cited by: 37

Related to: 10