Work

Deep Reactive Ion Etching (DRIE) Device in the MEMS Fabrications

Year: 2006

Type: article

Source: Chuangan jishu xuebao

Author: Jianzhi Li

Institution: China Electronics Technology Group Corporation

Language: English

Topic: Advanced MEMS and NEMS Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2360464821

FWCI:

Cites:

Cited by:

Related to: 10