Work

FRET acceptor suppressed single-particle photobleaching in semiconductor polymer dots

Year: 2016

Type: article

Source: Optics Letters

DOI: 10.1364/ol.41.002370

Authors: Zezhou Sun, Siyang Liu, Zhihe Liu, Weiping Qin, Danni Chen, Gaixia Xu, Changfeng Wu

Institutions: Jilin University, State Key Laboratory on Integrated Optoelectronics, Shenzhen University

Language: English

Topic: Quantum Dots Synthesis And Properties

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Award: 开关/闪烁可控聚合物量子点的设计制备及纳米分辨动态光学成像研究

OpenAlex ID: W2363649446

FWCI: 0.743

Cites: 21

Cited by: 12

Related to: 10