Work

INTERFACE DIFFUSION AND RESISTIVITY OF Ni/Al NANOMULTILAYERS

Year: 2008

Type: article

Source: Acta Metallurgica Sinica

Authors: Mingxia Liu, Zhang Jian-min, Kewei Xu

Language: English

Topic: Surface and Thin Film Phenomena

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2369010283

FWCI: 0.194

Cites:

Cited by: 1

Related to: 20