Work

Research and application of thick photoresist lithography using UV light

Year: 2003

Type: article

Source: Micronanoelectronic Technology

Author: Tan Zhi

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2376266960

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