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A New Method to Fabricate Attenuated Phase-shifting Mask with Photoresist Shifter

Year: 2001

Type: article

Source: Microfabrication Technology

Author: Jin Zhang

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2388542182

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