Work

Relationship of a-Silicon Remained Thickness and TFT Characteristic

Year: 2008

Type: article

Source: Advanced Display

Author: LI Dou-xi

Institution: BOE Technology Group (China)

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2389680235

FWCI:

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