Work

Tuning the thickness of black phosphorus via ion bombardment-free plasma etching for device performance improvement

Year: 2016

Type: article

Source: Journal of Materials Chemistry C

DOI: 10.1039/c6tc01514j

Authors: Geonyeop Lee, Jong-Young Lee, Gwan-Hyoung Lee, Jihyun Kim

Institutions: Yonsei University, Korea University

Language: English

Topic: 2D Materials and Applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: National Research Foundation of Korea, Korea Institute of Energy Technology Evaluation and Planning

Awards: G4536211375, G6240055474, G7579656371

OpenAlex ID: W2392653369

FWCI: 2.438

Cites: 34

Cited by: 51

Related to: 10