Work

Development and Applications of Thin Film Resists for Electron Beam Lithography

Year: 2016

Type: dissertation

Source: Scholars' Bank (University of Oregon)

Author: Kurtis C. Fairley

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2417945731

Cites: 101

Cited by:

Related to: 10