Work

Sub-30 keV patterning of HafSOx resist: Effects of voltage on resolution, contrast, and sensitivity

Year: 2016

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/1.4954394

Authors: Kurtis C. Fairley, Meredith C. Sharps, Gavin Mitchson, Jeffrey Ditto, Darren W. Johnson, David C. Johnson

Institution: University of Oregon

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Oregon State University, University of Oregon

Award: Center for Sustainable Materials Chemistry

OpenAlex ID: W2468604011

FWCI: 0.461

Cites: 19

Cited by: 10

Related to: 10