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구두발표 : A발표장 고분자2 ; A-21 : The Effect of NH3 Plasma Treatment on Low Dielectric Organosilicate Thin Film

Year: 2007

Type: article

Source: 화학공학의 이론과 응용

Authors: 김수한, 한준희, 차국헌

Language: Korean

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2469249009

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