Intrinsic electrical transport and performance projections of synthetic monolayer MoS 2 devices
Year: 2016
Type: article
Abstract: We demonstrate monolayer (1L) MoS 2 grown by chemical vapor deposition (CVD) with transport properties comparable to those of the best exfoliated 1L devices over a wide range of carrier densities (up to ∼10 13 cm −2 ) and temperatures (80–500 K). Transfer length measurements decouple the intrinsic material mobility from the contact resistance, at practical carrier densities (>10 12 cm −2 ). We demonstrate the highest current density reported to date (∼270 μ A μ m −1 or 44 MA cm −2 ) at 300 K for an 80 nm long device from CVD-grown 1L MoS 2 . Using simulations, we discuss what improvements of 1L MoS 2 are still required to meet technology roadmap requirements for low power and high performance applications. Such results are an important step towards large-area electronics based on 1L semiconductors.
Source: 2D Materials
Institution: Stanford University
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: bronze
Funders: National Science Foundation, Semiconductor Research Corporation, Stanford SystemX Alliance, Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung, Defense Advanced Research Projects Agency, Division of Emerging Frontiers in Research and Innovation, Air Force Office of Scientific Research
OpenAlex ID: W2486518419
