Work

Hot Filament Chemical Vapor Deposition: Enabling the Scalable Synthesis of Bilayer Graphene and Other Carbon Materials

Year: 2016
Type: book-chapter
Abstract: The hot filament chemical vapor deposition (HFCVD) technique is limited only by the size of the reactor and lends itself to be incorporated into continuous roll-to-roll industrial fabrication processes. We discuss the HFCVD reactor design and the interplay between the reactor parameters, such as filament and substrate temperatures, filament-to-substrate distance, and total pressure. Special attention is given to the large-area synthesis of bilayer graphene on copper, which is successfully grown by HFCVD with transmittance greater than 90% in the visible region and no gaps. We also discuss the HFCVD synthesis of carbon nanotubes, microcrystalline diamond, and nanocrystalline diamond.
Language: English
Open Access status: hybrid
OpenAlex ID: W2510288234
FWCI: 1.847
Cites: 32
Cited by: 5
Related to: 10