Work

A comparative study of the effect of dynamic stressing on high-field endurance and stability of reoxidized-nitrided, fluorinated and conventional oxides

Year: 2002

Type: conference-paper

Source: Technical digest - International Electron Devices Meeting/Technical digest

DOI: 10.1109/iedm.1991.235321

Authors: Z.H. Liu, E. Rosenbaum, P.K. Ko, C. Hu, Y.C. Cheng, C.G. Sodini, B.J. Gross, T.P. Ma

Institutions: University of California, Berkeley, Massachusetts Institute of Technology, Yale University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2532294276

FWCI:

Cites: 10

Cited by: 8

Related to: 10