Work

A highly manufacturable 0.18 μm generation logic technology

Year: 2003

Type: conference-paper

Source: Technical digest - International Electron Devices Meeting/Technical digest

DOI: 10.1109/iedm.1999.824242

Authors: S. Ikeda, Y. Yoshida, K. Shoji, K. Kuroda, K. Komori, N. Suzuki, K. Okuyama, S. Kamohara, N. Ishitsuka, H. Miura, E. Murakami, T. Yamanaka

Institution: Hitachi (Japan)

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2542294342

FWCI: 1.297

Cites: 2

Cited by: 6

Related to: 10