Self-assembling resists for nanolithography
Year: 2006
Type: conference-paper
Authors: P.F. Nealey, E.W. Edwards, M. Muller, M.P. Stoykovich, H.H. Solak, J.J. de Pablo
Institutions: University of Wisconsin–Madison, Paul Scherrer Institute
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2546001645