Thin film bi-epitaxy and transition characteristics of TiO2/TiN buffered VO2 on Si(100) substrates
Year: 2016
Type: article
Source: MRS Advances
DOI: 10.1557/adv.2016.544
Institutions: North Carolina State University, Intel (United States)
Language: English
Subfield: Polymers and Plastics
Field: Materials Science
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W2549007307
