Work

Polishing-pad-free electrochemical mechanical polishing of single-crystalline SiC surfaces using polyurethane–CeO2 core–shell particles

Year: 2016

Type: article

Source: International Journal of Machine Tools and Manufacture

DOI: 10.1016/j.ijmachtools.2016.11.007

Authors: Junji Murata, Koushi Yodogawa, Kazuma Ban

Institution: Kindai University

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Japan Society for the Promotion of Science

Award: Development of chemical slicing method for Photovaltaic materials with low ker-loss and thin wafer thickness

OpenAlex ID: W2556740465

FWCI: 4.713

Cites: 28

Cited by: 123

Related to: 10