Work

Applications of the electron beam exposure system (EBES)

Year: 1974

Type: conference-paper

Source: Technical digest - International Electron Devices Meeting/Technical digest

DOI: 10.1109/iedm.1974.6219624

Authors: R.F.W. Pease, J.P. Ballantyne, R.C. Henderson, A.M. Voshchenkov, L.D. Yau

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2563639567

FWCI: 1.209

Cites:

Cited by: 1

Related to: 10