Work

Role of Interface Charges on High-k Based Poly-si and Metal Gate Nano-scale Mosfets

Year: 2011

Type: article

Source: DOAJ (DOAJ: Directory of Open Access Journals)

Authors: N. Shashank, Vikram Singh

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2563641070

FWCI:

Cites:

Cited by: 8

Related to: 10