Work

High Aspect Ratio (~25:1) Sub-10 Nm HSQ Lines Using Electron Beam Lithography

Year: 2012

Type: conference-paper

Source: ENLIGHTEN (Jurnal Bimbingan dan Konseling Islam)

Authors: Muhammad Mirza, Haiping Zhou, Kevin E. Docherty, S. Thoms, D.S. Macintyre, Douglas J. Paul

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2581196392

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Related to: 10