Work

Grayscale Lithography to Fabricate Varying-depth Nanochannels in a Single Step

Year: 2016

Type: conference-paper

Abstract: We report a new, fast and versatile method to fabricate nanochannels with non-uniform depth in a single step, in the range 50-500nm. The process is based on maskless laser lithography to structure a photosensitive resist (PR). The lateral dimension can be as small as 2µm. Functional nanofluidic chips with slopes, steps, and pore networks mimicking a nanoporous medium were fabricated and tested.

Source: HAL

Authors: Naillon, Antoine, Massadi, Hajar, Courson, Rémi, Calmon, Pierre-François, Seveno, Lucie, Prat, Marc, Joseph, Pierre

Institutions: Institut de Mécanique des Fluides de Toulouse, Kloé (France)

Language: English

Topic: Microfluidic and Capillary Electrophoresis Applications

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W2591775197

FWCI:

Cites: 2

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Related to: 10