Work

Assembly of block copolymer films between chemically patterned and chemically homogeneous surface

Year: 2012

Type: article

Source: Bulletin of the American Physical Society

Authors: Jeong In Lee, Huiman Kang, Hyo Seon Suh, Christopher J. Thode, Lei Wan, Abelrado Hernandez, Yasuhiko Tada, Hiroshi Yoshida, Juan Pablo, Paul F. Nealey

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2597057709

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