Three-coil inductively coupled plasma (ICP) source with individually controlled coil currents supplied from a single power generator
Year: 2013
Type: article
Authors: L. Dorf, Shahid Rauf, Jonathan Liu, Jason Kenney, Steven Lane, Andrew Nguyen, K. Ramaswamy, Ken Collins
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2599391503
