Work

Molecular force modeling of lithography (Conference Presentation)

Year: 2017

Type: conference-paper

DOI: 10.1117/12.2257363

Authors: Zhimin Zhu, Amanda G. Riojas, Trisha May, Joyce Lowes, Nickolas L. Brakensiek, Daniel M. Sullivan

Institution: Brewer Science (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2611526944

FWCI:

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