Year: 2012
Type: conference-paper
Abstract: In this study, we develop two-photon nanostereolithography combined with deactivation process using a femtosecond pulsed (fs) near-infrared (near-IR) laser and a compact continuous-wave (CW) near-IR laser. In our method, we induce two-photon polymerization by the fs pulsed laser beam while deactivating the polymerization by the CW laser beam. In order to demonstrate our method, we constructed a nanostereolithography system with a fs pulsed laser and a CW laser. Using the nanostereolithography system, we confirmed that irradiation of the CW laser beam could inhibit two-photon polymerization reaction completely. In addition, we fabricated several fine lines by focusing both laser beams with different offsets. As a result, the minimum line width was approximately 70nm. It is the first demonstration of fabrication of sub-100nm lines by using photo-induced deactivation with compact CW laser.
Authors: Akihito Ono, John T. Fourkas, Shoji Maruo
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: diamond
OpenAlex ID: W2653844539