Work

Electrical properties of HfO 2 charge trap flash memory with SiO 2/HfO 2/Al 2O 3 engineered tunnel layer

Year: 2010

Type: article

Authors: Se-Man Oh, Hee-Wook You, Kwan-Su Kim, Young-Hie Lee, Won-Ju Cho

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2706235765

FWCI: 0.245

Cites:

Cited by: 1

Related to: 10