Work

Application of resist-profile-aware source optimization in 28 nm full chip optical proximity correction

Year: 2017

Type: article

Source: Journal of Semiconductors

DOI: 10.1088/1674-4926/38/7/074007

Authors: Jun Zhu, David Wei Zhang, Chinte Kuo, Qing Wang, Fang Wei, Chenming Zhang, Han Chen, Daquan He, Stephen D. Hsu

Institutions: Fudan University, State Key Laboratory of ASIC and System, Shanghai Huali Microelectronics (China), ASML (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Agencia Estatal de Investigación

OpenAlex ID: W2725628629

FWCI:

Cites: 17

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Related to: 10