Work

High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond

Year: 2017

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.16.4.041010

Authors: Jan van Schoot, Eelco van Setten, Gijsbert Rispens, Kars Z. Troost, Bernhard Kneer, Sascha Migura, Jens Timo Neumann, Winfried Kaiser

Institutions: ASML (Netherlands), Carl Zeiss (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Electronic Components and Systems for European Leadership

OpenAlex ID: W2766524046

FWCI: 1.785

Cites: 44

Cited by: 60

Related to: 10