Reducing the contact and channel resistances of black phosphorus via low-temperature vacuum annealing
Year: 2018
Type: article
Source: Journal of Materials Chemistry C
DOI: 10.1039/c7tc05325h
Authors: Hyunik Park, Jongha Son, Jihyun Kim
Institution: Korea University
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Awards: G4369048575, G6240055474
OpenAlex ID: W2782634695
