Reactive chemical vapor deposition of heteroepitaxial Ti 1−x Al x N films
Year: 2018
Type: article
Source: CrystEngComm
DOI: 10.1039/c7ce02129a
Authors: F. Mercier, H. Shimoda, S. Lay, M. Pons, E. Blanquet
Language: English
Subfield: Condensed Matter Physics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2787194140