Deep level defects in Ge-doped (010) β-Ga2O3 layers grown by plasma-assisted molecular beam epitaxy
Year: 2018
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.5010608
Language: English
Topic: Ga2O3 and related materials
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Awards: G1375200875, G3228853530
OpenAlex ID: W2793579692
